Bruker Dimension Edge AFM for Patterned Sapphire Substrates

Bruker's Dimension Edge™ PSS Atomic Force Microscope with AutoMET™ Metrology Software is the ideal nano-metrology and nano-inspection system for LED substrate and epitaxial manufacturers. As an extension of the Dimension Edge AFM platform, the Edge PSS incorporates the incredible value and resolution for which the Dimension AFM systems are renowned, while also providing a production-based solution for substrate measurements.

As the pitch of patterned sapphire substrate (PSS) goes below 2 microns, traditional confocal techniques lose the resolution needed to provide valuable process metrology. The Dimension Edge PSS atomic force microscope (AFM) solves this need with sub-nanometer resolution and the ability to measure up to nine 2-inch wafers at a time (or a single 4- or 6-inch wafer), providing all the data necessary to keep the PSS manufacturing process under control.

In addition to the specific PSS measurement capabilities built into the Dimension Edge PSS, the system also incorporates all of the world-leading Bruker AFM technology that the Dimension microscopes have become famous for, including high resolution and low noise for epitaxial roughness measurements, and such standard and proprietary AFM modes as TappingMode, Contact Mode, PhaseImaging™ and LiftMode™.

For further information please contact us or download the datasheet.