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New Dimension IconIR300 System

Home News New Dimension IconIR300 System
New Dimension IconIR300 System
06 Jul

New Dimension IconIR300 System

Bruker’s new Dimension IconIR300 large-sample nanoIR system provides high-speed, high-accuracy nanoscale characterisation for semiconductor applications, featuring unrivalled capabilities and measurement of samples up to 300mm across. Through its combination of proprietary photothermal IR spectroscopy and nanoscale AFM property mapping capabilities, IconIR300 enables automated wafer inspection and defect identification on the widest range of wafer and photomask samples. The system significantly extends the application of AFM-IR technology to semiconductor industry segments beyond the reach of traditional techniques.

 

Built on the groundbreaking large-sample architecture of the Dimension IconIR system, IconIR300 provides correlative microscopy and chemical imaging, as well as enhanced resolution and sensitivity. Integrated with automated wafer handling and advanced data collection/analysis software, the system enables greater time- and cost-savings and production efficiency.

 

  • Highly accurate, rich, detailed spectra with FTIR correlation, achieving nanometre-level measurement of thin contaminants
  • A variety of advanced operational modes supporting the measurement of a wide range of samples for both industrial and academic users
  • Highest performance AFM-IR spectroscopy, the leading nanoIR mode in semiconductor applications
  • Reliable surface-sensitive chemical measurements for polymeric films

 

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