Bruker FilmTek 2000 PAR-SE Benchtop Ellipsometer

Combining patented Multi-Angle Differential Polarimetry (MADP) and Differential Power Spectral Density (DPSD) technology, the FilmTek™ 2000 PAR-SE utilises multi-angle and multi-modal data collection to independently measure film thickness and index of refraction. By independently measuring index and thickness, the FilmTek 2000 PAR-SE is far more sensitive to changes in films, particularly films within multi-layer stacks, than existing metrology tools that rely on conventional ellipsometry or reflectometry techniques. The FilmTek 2000 PAR-SE is a fully-integrated package, paired with advanced material modeling software to make even the most rigorous measurement of patterned wafers reliable and intuitive.

• Sample compatibility and material modelling: delivers industry-leading speed and precision for nearly any advanced thin film measurement application

• Combined FilmTek system design: fulfils measurement requirements beyond the needs of mainstream applications and the capabilities of standard instrumentation

• Software and hardware: provides exceptional flexibility for further customisation to meet non-standard measurement requirements