Evactron A50 Alternate-gas plasma cleaning for SEM, FIB and vacuum chambers

The Evactron E50 De-Contaminators are compact, high performance yet simplified plasma cleaners for Electron and Ion Beam Instruments such as SEMs, TEMs, and FIBs. The E50 delivers high power cleaning for superior resolution and imaging plus improved detector and probe sensitivity that are compromised by contamination. The compact design of the Evactron E50 Plasma Radical Source (PRS) makes it a versatile solution for either SEM/FIB chambers, load locks, or sample prep chambers. The Evactron E50 offers fast, effective, and powerful cleaning over a wide range of pressures, enabling high quality, artifact free images and increased efficiency of sample analysis.

The Evactron^® A50 Alternate Gas Plasma Cleaner has two configurations: an ultrahigh-purity filter (3 nm pore size) version that meets the stringent SEMI F38-0699 requirements of the semiconductor industry, and a precision filter (0.5 µm pore size) version for general lab conditions. In-line filters prevent particulates from gas feedlines entering the plasma stream. Alternate gases tested include O₂, Clean Dry Air, Ar/H₂, Ar/O₂, N₂/H₂ and N₂. The use of 100% H₂ is not recommended for safety reasons.

RF Power - 75W peak, 50W continuous power output

Fast cleaning - Maximum instrument uptime and productivity

Dual action cleaning - Advanced cleaning using both plasma and UV afterglow

Energy efficient - Hollow cathode, capacitive coupled plasma (CCP) technology

Pop ignition - Ignition technology at high vacuum

Programmable & smart control - Set power, cleaning time, cycles and recipes via a custom remove or tethered touchpad

Alternative gases - Run a range of process gases to tailor the cleaning chemistry to your application

Wide pressure range - Operation from 0.3 Pa (2 mTorr) to 80 Pa (600 mTorr)