Fast, effective and powerful cleaning over a wide range of pressures
The Evactron U50 De-Contaminator is a compact, high performance yet simplified plasma cleaner for instruments and chambers designed to operate at UHV conditions. The U50 delivers high power cleaning for removal of hydrocarbon contamination on chamber and sample surfaces.
The compact design of the Evactron U50 Plasma Radical Source (PRS) makes it a versatile solution for either instrument chambers, load locks, or sample prep chambers. The Evactron U50 offers fast, effective, and powerful cleaning over a wide range of pressures, enabling hydrocarbon-free RGA spectra and fast pump down time to UHV.
RF Power - 75W peak, 50W continuous power output
Bakeable design - Withstands backout to 150°C; TMP-compatible with no advance venting
Dual-action cleaning - Combines plasma and UV afterglow to remove hydrocarbon contamination
UHV compatibility - Conflat 2.75 flange and a leak rate below 10-11 Torr make it UHV-ready
Energy Efficient - Hollow cathode, capacitive coupled plasma (CCP) technology
Programmable control - Power, cleaning time, cycle count and recipes are all user-programmable
Fast cleaning - > 100x faster than earlier Evactron models, with simple push-button operation
Alternative gases - run a range of process gases to tailor the cleaning chemistry to your application
Wide pressure range - Operation from 0.3 Pa to 80 Pa (2 mTorr to 600 mTorr)
External interlock - Optional external interlock connection for safety
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Sales and Applications EM
Sydney • New South Wales