PLEASANTON, CA (May 19, 2026) – Gatan, Inc., a business of AMETEK Inc. and a global leader in instrumentation that enhances and extends the performance of electron microscopes, today announced the launch of the PECS™ III and Ilion® III systems. These next generation, complementary solutions represent an important evolution of Gatan’s ion milling portfolio, delivering consistent, high quality sample preparation across a wide range of materials for advanced materials characterisation and industrial laboratory workflows.
The PECS III precision etching and coating system is a broad beam ion milling solution engineered to produce consistent, low damage surfaces across semiconductors, battery materials, and advanced materials within a single, integrated workflow. Designed to address the growing complexity of modern samples, PECS III enables reliable preparation of multi material systems while reducing operator dependence and minimising preparation induced artifacts.
PECS III improves throughput for challenging materials by delivering higher milling rates and enabling preparation of larger areas including 14 mm cross‑sections that are up to seven times wider than previous approaches. Its ability to generate highly uniform surfaces across large areas makes it well suited for analytical techniques such as EBSD, EDS, WDS, and cathodoluminescence, where surface quality directly impacts data accuracy and reproducibility.
For further information please contact us or read more on the new PECS III or new Ilion III.
