Bruker Dimension IconIR300 Nanoscale Infrared Spectrometer

The Dimension IconIR300™ large-sample nanoIR system provides high-speed, high-accuracy nanoscale characterisation for semiconductor applications, featuring unrivaled capabilities, sample size, and material type flexibility. Through its combination of proprietary photothermal IR spectroscopy and nanoscale AFM property mapping capabilities, IconIR300 enables automated wafer inspection and defect identification on the widest range of wafer and photomask samples. The system significantly extends the application of AFM-IR technology to semiconductor industry segments beyond the reach of traditional techniques.

Built on the groundbreaking large-sample architecture of the Dimension IconIR system, IconIR300 provides correlative microscopy and chemical imaging, as well as enhanced resolution and sensitivity. Integrated with automated wafer handling and advanced data collection/analysis software, the system enables greater time- and cost-savings and production efficiency.

Features:

• Whole-wafer, non-destructive measurement of 200mm and 300mm wafers

• Unambiguous identification of organic and inorganic nano-contaminants on semiconductor wafers and photomasks with data directly correlating to TRIF libraries

• Non-destructive step-height measurement and nanoscale materials property mapping

• Automated, recipe-based measurements and KLARF file support for user-friendly access to comprehensive data