Spectroscopic reflectometry for thickness measurement of thin to very thick films on micron-sized device features
The FilmTek 2000M™ provides a measurement spot size as small as 1 x 2 µm and a nearly collimated beam. This approach allows accurate, non-contact measurement of thin to very thick films. With automated wafer handling, 1D/2D barcode scanner, and pattern recognition, straightforward measurements from an entire device wafer can be obtained, eliminating the need to infer broader performance from a limited sample area.
Sample compatibility: Enables accurate characterisation of samples far outside the measurable thickness range of competing systems
Spectroscopic reflectometer : Enables measurement on a wide range of film types and thicknesses in many diverse application areas
Optical design : Achieves small measurement spot sizes down to 2 µm
Enables simultaneous determination of : Multiple layer thicknesses, Indices of refraction [n(λ)], Extinction (absorption) coefficients [k(λ)], Energy band gap [Eg], Critical dimension (CD) measurement
Send us a message and our team will get back to you.
Sales and Applications
Brisbane • Queensland
Sales
Adelaide • South Australia